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Eitre allows replication of patterns in the micro- and nanometer range. It offers a complete range of imprint methods, including thermal NIL, hot embossing, UV NIL, as well as Obducat's proprietary Simultanous Thermal and UV (STU®) imprint process. All Nano Imprint Lithography (NIL) systems from Obducat are equipped with full area thermal imprint, using the patented Soft Press® technology. The proprietary design of the heater, embedded in the substrate chuck, provides a homogeneous temperature distribution across the whole imprint area. The uniform heating and a wide range of temperature settings, makes it possible to use a wide range of imprint polymer. The proprietary Simultaneous Thermal and UV (STU®) technology enables simultaneously combined thermal and UV nano imprint lithography, allowing the complete imprint sequence into UV-curable thermoplastic pre-polymers to be performed at a constant temperature.
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