Patents  

Patents granted

  1. S.E. Pratsinis, G. Wang, M.K. Akhtar, S. Panda, “Process for Aluminum Nitride Powder Production”, US Patent 5,525,320 (1996).

  2. C. Collins, R. Jammy, B. Messenger, S. Panda “Method of Trench Sidewall Enhancement”, US Patent 6,706,586 (2004).

  3. S. Panda, R. Ranade, G. Mathad, “Method to Increase the Etch Rate and Depth in High Aspect Ratio Structure”, US Patent 6,709,917 (2004).

  4. G. Mathad, S. Panda, R. Ranade, “Method of Etching High Aspect Ratio Openings”, US Patent 6,743,727 (2004), Taiwan Patent TW 0544793 (2003), Japan Patent JP 3659933.

  5. D. Dobuzinsky, S. Panda, R. Weis, R. Wise, “Method for Improving Etch Uniformity in Deep Silicon Etching”, US Patent 6,806,200 (2004).

  6. K. Chan, M. Khater, S. Panda, K. Schonenberg, “Structure and Method for Making Heterojunction Bipolar Transistor having Self-aligned Silicon-germanium Raised Extrinsic Base”, US Patent 6,982,442 (2005).

  7. V. Balasubramanium, K. Inazawa, R. Wise, S. Panda, A. Mahorowala, “Method and Apparatus for Multilayer Photoresist Dry Development”, Taiwan Patent TW I228751(2005. US Patent 7,334,991 (2008).

  8. H.Yan, B. Ji, S. Panda, R. Wise, B. Chen, Apparatus and Method for Shielding a Wafer from Charged Particles During Plasma Etching”, Taiwan Patent TW I232705 (2005), US Patent 7,438,822 (2008).

  9. D. Dobuzinsky, J. Beintner, S. Panda, “Formation of Controlled Sublithographic Structures”, US Patent 7,087,532 (2006).

  10. H. Chen, D. Chidambarrao, S-H. Oh, S. Panda, W.A. Rausch, T. Sato, H. Utomo, “Structure and Method for Making Strained Channel Field Effect Transistor Using Sacrificial Spacer”, US Patent 7,135,724 (2006).

  11. H. Chen, D. Chidambarrao, S. Panda, S.-H. Oh, H. Utomo, W. Rausch “In situ Doped Embedded SiGe Extension and Source/Drain for Enhanced PFET Performance”, US Patent 7,176,481 (2007).

  12. S. Panda, R. Wise “Silicon precursors for deep trench silicon etch processes”, US Patent 7,186,660 (2007).

  13. S. Panda, M. Sievers, R. Wise “Non-destructive in-situ elemental profiling”, US Patent 7,256,399 (2007).

  14. M. Sievers, S. Panda, R.Wise “Gas filled reactive atomic force microscope probe”, US Patent 7,278,300 (2007).

  15. S. Panda, R. Wise, D. Murthy, K. Subramanian “Silicon Nitride Etching Methods”, US Patent 7,288,482 (2007).

  16. M. Sievers, R. Wise, S. Panda “Endpoint Detection for the Patterning of Layered Materials”, US Patent 7,285,775 (2007).

  17. B. Chen, M. Hakey, D. Horak, S. Panda, R.Wise “Pre-loaded plasma reactor apparatus and application thereof”, Japan Patent 3996569 (2007), Taiwan Patent I306363 (2009).

  18. T.W. Dyer, S. Fang, J. Yan, S. Panda, Y.M. Lee, and J.J.Kim“Post-Silicide Spacer Removal”, US Patent 7,393,746 (2008).

  19. D. Chidambarrao, J. Holt, M. Ieong, C. Ouyang, S. Panda “Stressed Field Effect Transistors on Hybrid Orientation Substrate”, US Patent 7,405,436 (2008).

  20. Y.F. Chong, B.J. Greene, S. Panda, N. Rovedo “Method to Engineer Etch Profiles in Si Substrate for Advanced Semiconductor Devices”, US Patent 7,442,618 (2008), Singapore Patent 129354 (2009).

  21. R. Amos, W. Natzle, S. Panda, B. Tessier “Field Effect Device with Reduced Thickness Gate”, US Patent 7,459,382 (2008).

  22. M. Ieong, X.H. Liu, Q.C. Ouyang, S. Panda, H. Yin “Strained MOS devices using source/drain epitaxy”, US Patent 7,525,161 (2009).

  23. S.Panda, R. Wise “Method of processing wafers with resonant heating”, US Patent 7,645,356 (2010).

  24. H. Chen, D. Chidambarrao, S.-H. Oh, S. Panda, W.A. Rausch, T. Sato, H. Utomo “Structure and method for making strained channel field effect transistor using sacrificial spacer”, US Patent 7,645,656 (2010).

  25. D. Chidambarrao, J.R. Holt, M. Ieong, Q.C. Ouyang, S. Panda “Stressed field effect transistors on hybrid orientation substrate”, US Patent 7,687,829 (2010).

  26. H.S. Yang, S. Panda “Method to increase strain enhancement with spacerless FET and dual liner process”, US Patent 7,709,317 (2010).

  27. S. Panda, R. Wise, L. Chen, M. Sievers “Method and apparatus for detecting endpoint in a dry etching system by monitoring a superimposed DC current”, US Patent 7,754,615 (2010).

  28. J.C. Arnold, D. Chidambarrao, Y. Li, R. Malik, S. Narasimha, S. Panda, B. Tessier, R. Wise “Semiconductor device structure having low and high performance devices of same conductive type on same substrate”, US Patent 7,776,695 (2010).

  29. B.J. Greene, C.W. Lai, Y.M. Lee, W. Lin, S. Panda, K. Rim, Y.W. Teh “Method and apparatus for post-silicide spacer removal”, Singapore Patent 132629 (2010).

  30. H. Chen, D. Chidambarrao, J. Holt, Q.C. Ouyang, S. Panda “Method of forming a cross-section hourglass shaped channel region for charge carrier mobility modification”, US Patent 7,863,197 (2011).

  31. V. Balasubramanium, K. Inazawa, R.Inazawa, R. Wise, S. Panda, A. Mahorowala “Method and Apparatus for Multilayer Photoresist Dry Development”, US Patent 8,048,325 (2011).

  32. . R. Amos, W. Natzle, S. Panda, B. Tessier “Field Effect Device with Reduced Thickness Gate”, US Patent 8,492,803 (2013).

  33. S. Panda and H.A. Ahmad “Flexible Temperature Sensor and Sensor Array”, US Patent 8,783,948 (2014), Indian Patent Application 1520/DEL/2010.

Patent applications

  1. B.A. Chen, R. Jammy, S. Panda, R. Wise, “Method of enhancing surface reactions by local resonant heating”, US Patent Application 20040112863.

  2. S.Panda, A. Mosden, R. Wise, K. Sugiyama, J.G. Camilleri, “Method and system For deep trench silicon etch”, US Patent Application 20040256353.

  3. V. Balasubramaniam, K. Inazawa, S. Panda, R. Wise, A.P. Mahorowala, “Method and apparatus for etching an organic layer”, US Patent Application 20050136666.

  4. J.R. Holt, S. Panda, “Method for post-RIE passivation of semiconductor surfaces for epitaxial growth”, US Patent Application 20070048980.

  5. S. Iseda, S. Panda, M.R. Sievers, R.Wise, “Polysilicon etching methods”, US Patent Application 20070056930.

  6. H.S. Yang, S. Panda, “Structure and method to increase strain enhancement with spacerless FET and dual liner process”, US Patent Application 20070108525.

  7. Z. Luo, H.Y. Ng, N. Rovedo, P.T. Nguyen, W.C. Wille, R. Lindsay, Z. Lun, Y.F. Chong, S. Panda, “Semiconductor structure including isolation region with variable linewidth and method for fabrication therof”, US Patent Application 20070293016.

  8. A.F. Munoz, S. Panda, M.R. Sievers, R. Wise, “Elevated temperature chemical oxide removal module and process”, US Patent Application 20080078743.

  9. S. Panda, R.Wise, “Method for precise temperature cycling in chemical/biochemical processes”, US Patent Application 20080118955.

  10. H. Zhu, S. Panda, J.W. Strane, S.-P. Sun, B.L. Tessier, “Structure and method of manufacturing a strained FINFET with stressed silicide”, US Patent Application 20080173942.

  11. D.M. Dobuzinsky, J.E. Faltermeier, N. Kusaba, J.C. Liu, M.D. Naeem, S. Panda, R.Wise, H. Yan, “Methods for forming nested and isolated lines in semiconductor devices”, US Patent Application 20090104776.

  12. S. Panda and A. Agarwal, “A process for fabrication of an electrolyte insulator semiconductor device having multistep reservior”, Indian Patent Application 219/DEL/2010.

  13. S. Panda and S. Dastidar, “Nanotextured Dielectric in Electrolyte Insulator Semiconductor Devices for Enhanced Sensitivity”, Indian Patent Application 1852/DEL/2010.

  14. S. Panda, “Cancer detection system”, Indian Patent Application 3348/DEL/2011.

  15. S. Panda and S. Kumar, “A nanotextured surface immobilized structure-modified enzyme biocatalyst”, Indian Patent Application 2966/DEL/2012.

  16. S. Panda and R. Chepyala, “An Electrolyte Insulator Semiconductor based microfluidic immunosensor device”, Indian Patent Application (Provisional) 545/DEL/2013.

  17. R. Chepyala and S. Panda, “Surface Functionalization Unit”, Indian Patent Application (Provisional) 546/DEL/2013.

  18. R. Chepyala and S. Panda, “A Portable Microfluidic Chip Holder”, Indian Patent Application 3643/DEL/2015.

  19. R. Chepyala and S. Panda, “Microvalve for Fluidic Applications”, Indian Patent Application 3565/DEL/2015.

  20. N. Sekar, R.D. Telore, V.S. Patil, V.S. Padalkar, C.R Suri, A.K. Paul, S. Panda, “Xanthane Based Compounds and Derivatives Thereof”, Indian Patent Application, 1542/MUM/2015.

  21. C.R. Suri, N. Sekar, A.K.Paul, S. Panda, R. Verma, A. Kashyap, S. Dhar, “A System and Method for Detecting Nitrate Containing Compounds”, 689/DEL/2015.

  22. A.K. Paul, C.R. Suri, N. Sekar, S. Panda, A.P. Bhondekar, V. Aaydha, S. Choudhary, “An Immunochemical Method and Device for Detecting Nitroexplosive compounds”, 4209/DEL/2015.

  23. S. Panda, M. Sinha, �A Breathalyzer for Disease Detection�, Indian Patent Application,201611039541

  24. S.Panda, M.Sinha, �Polyaniline Linked Metal Phthalocyanine Based Flexible Gas Sensors�,, Indian Patent Application, 201611039574.

  25. S. Panda, K. Dutta, "A Process of Synthesizing a Composite of Aniline, N-Phenylglycine and Graphene oxide and Product Thereof for Sensing of Metal Ions",Indian Patent Application, 201811036105.

  26. S. Panda, N. Kumar, "Development of a IGZO Based Dual Gate ISFET Using Al2O3 as Top Gate/Sensing Dielectric", Indian Patent Application,201911005381.

  27. S. Panda, D. Bhatt, N. Kumar, "An IGZO Based Dual Gate Ion Sensitive Field Effect Transistor",Indian Patent Application, 201911024882.

  28. S. Panda, D. Bhatt and S. Kumar, "A Process for Fabrication of Electrolytic Gated Field-Effect Transistor-Based Sensors",Indian Patent Application 201911053908.

  29. V. Srivastava and S. Panda, "A Wearable Device for Assisting a Visually Impaired User",Indian Patent Application 201911054738.

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