System specification:
- Cylindrical stainless steel chamber
- Turbo molecular vacuum pumping system with rotary vane pump
- 3" diameter view port
- Single/multiple magnetron gun assemblies with 2.00"dia. x 0.125" thick target sizes
- Motorized shutter assembly for all sources
- One 13.5MHz, 300 W (max power) RF power source and one Pulsed/DC power source
- Quartz crystal film thickness monitor
- Mass flow controller with digital readout
- Full range vacuum gauge with display
- Water chiller
Capabilities:
- Deposition of metals/non metals and non-magnetic films
- Deposition of multi-layer films with selected target materials
- Adjustable substrate to target spacing
- Wafers up to 2" diameter can be deposited
- Substrate heating up to 800oC available
- Reactive sputtering with oxygen
- Substrate bias capability up to 30W RF power
- Thickness Monitor
- Substrate rotation up to 20 RPM for better uniformity