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Pulsed Laser Deposition System for Thin Films Growth of Oxides

The instrument can grow thin films of complex oxides using KrF excimer laser operating at 248 nm. The growth can be carried out at various combinations of pressure of oxygen in the vacuum chamber, laser repetition rate and energy as well as substrate temperature.

 
 

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Equipment 1


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Prof. Ashish Garg

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Automotive industry
Defense
Microelectronic industry


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Oxides, Thin Films, Excimer Laser, Thin Films, Devices


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WL-104, This email address is being protected from spambots. You need JavaScript enabled to view it.

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WL-105


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Contact Prof. Ashish Garg


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